Abstract
As a recent member of the two-dimensional (2D) van der Waals (vdW) heterostructures, the heterostructure has received considerable attention due to its fascinating characteristics compared with the constituent 2D materials. In this paper, we performed first-principles calculations to investigate its structural, electronic, and magnetic properties and explored the effects of interlayer and in-plane strains on these properties. Our results reveal that the antiferromagnetic (AFM) ground state in the layer of the heterostructure is maintained owing to weak vdW interactions between the and layers. However, the AFM state can be transformed into the ferromagnetic state at interlayer compressive strain of −19% or in-plane tensile strain of 2.5%. Moreover, the heterointerface belongs to the metal-semiconductor interface and exhibits -type ohmic contact and low contact resistance. The transition from -type ohmic contact to -type Schottky contact or -type Schottky contact can be achieved by interlayer or in-plane strain engineering, which is associated with the strain-induced energy shifts of the valence band maximum and conduction band minimum of . Additionally, the tunneling probability of the heterostructure rises dramatically (up to 100%) with interlayer coupling, which is favorable for carrier transport at the heterointerface. Our findings demonstrate that strain engineering is an effective way of modulating metal-semiconductor interfaces and provide theoretical guidance for designing electronic and magnetic devices based on the vdW heterostructure as well as broadening its applications in future functional devices.
- Received 5 October 2023
- Accepted 21 December 2023
DOI:https://doi.org/10.1103/PhysRevMaterials.8.014003
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