• Open Access

Protected ultrathin cuprous oxide film for photocatalysis: Excitation and relaxation dynamics

Jan Beckord, J. Trey Diulus, Zbynek Novotny, Jürg Osterwalder, and Matthias Hengsberger
Phys. Rev. Materials 7, 045801 – Published 6 April 2023
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Abstract

In the search for cost-effective ways to produce green hydrogen, harnessing the most abundant renewable energy source—sunlight—directly through photoelectrochemical water splitting is highly desirable. Cuprous oxide (Cu2O) has proven itself as a material with great potential for the hydrogen evolution reaction (HER) and stands out by its Earth abundance and low processing cost. In this photoelectron spectroscopy study we investigated the electron dynamics in a heterostructure comprised of a Cu2O surface oxide grown on Cu(111) underneath a hexagonal boron nitride (h-BN) film, which replaces a conventional capping layer for corrosion protection. Our results show that it can be a viable cuprous oxide-based photoelectrode material. The h-BN film stays intact during the oxidation, and the oxide layer forms an ordered structure with defined valence and conduction bands. The conduction band is at a suitable energy to drive the HER for water splitting, but the photoexcited electrons display short lifetimes. Electrons are mainly excited in the copper substrate and are then captured in long-lived defect states in the Cu2O layer. The water splitting efficiency of this photocathode may still be improved by reducing the defect density.

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  • Received 15 December 2022
  • Accepted 22 March 2023

DOI:https://doi.org/10.1103/PhysRevMaterials.7.045801

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jan Beckord1, J. Trey Diulus1,2, Zbynek Novotny1,2,*, Jürg Osterwalder1, and Matthias Hengsberger1,†

  • 1Department of Physics, University of Zurich, Winterthurerstrasse 190, 8057 Zurich, Switzerland
  • 2Swiss Light Source, Paul Scherrer Institute, Forschungsstrasse 111, 5232 Villigen, Switzerland

  • *Present address: Laboratory for Joining Technologies and Corrosion, Empa, Swiss Federal Laboratories for Materials Science and Technology, Ueberlandstrasse 129, 8600 Duebendorf, Switzerland.
  • Corresponding author: matthias.hengsberger@physik.uzh.ch

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Issue

Vol. 7, Iss. 4 — April 2023

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