Tailoring magnetism in self-intercalated Cr1+δTe2 epitaxial films

Y. Fujisawa, M. Pardo-Almanza, J. Garland, K. Yamagami, X. Zhu, X. Chen, K. Araki, T. Takeda, M. Kobayashi, Y. Takeda, C. H. Hsu, F. C. Chuang, R. Laskowski, K. H. Khoo, A. Soumyanarayanan, and Y. Okada
Phys. Rev. Materials 4, 114001 – Published 4 November 2020
PDFHTMLExport Citation

Abstract

Magnetic transition metal dichalcogenide (TMD) films have recently emerged as promising candidates in hosting novel magnetic phases relevant to next-generation spintronic devices. However, systematic control of the magnetization orientation, or anisotropy, and its thermal stability characterized by Curie temperature (TC), remains to be achieved in such films. Here we present self-intercalated epitaxial Cr1+δTe2 films as a platform for achieving systematic/smooth magnetic tailoring in TMD films. Using a molecular-beam epitaxy based technique, we have realized epitaxial Cr1+δTe2 films with smoothly tunable δ over a wide range (0.33–0.82), while maintaining NiAs-type crystal structure. With increasing δ, we found monotonic enhancement of TC from 160 to 350 K, and the rotation of magnetic anisotropy from out-of-plane to in-plane easy-axis configuration for fixed film thickness. Contributions from conventional dipolar and orbital moment terms are insufficient to explain the observed evolution of magnetic behavior with δ. Instead, ab initio calculations suggest that the emergence of antiferromagnetic interactions with δ, and its interplay with conventional ferromagnetism, may play a key role in the observed trends. This demonstration of tunable TC and magnetic anisotropy across room temperature in TMD films paves the way for engineering different magnetic phases for spintronic applications.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 25 May 2020
  • Revised 1 August 2020
  • Accepted 20 August 2020

DOI:https://doi.org/10.1103/PhysRevMaterials.4.114001

©2020 American Physical Society

Physics Subject Headings (PhySH)

  1. Research Areas
Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Y. Fujisawa1, M. Pardo-Almanza1, J. Garland1,2, K. Yamagami1, X. Zhu1, X. Chen3, K. Araki4, T. Takeda4, M. Kobayashi4,5, Y. Takeda6, C. H. Hsu7, F. C. Chuang7, R. Laskowski8, K. H. Khoo8, A. Soumyanarayanan3,9, and Y. Okada1

  • 1Quantum Materials Science Unit, Okinawa Institute of Science and Technology (OIST), Okinawa 904-0495, Japan
  • 2Applied Physics & Mathematics Department, Northeastern University, Boston, Massachusetts 02115, USA
  • 3Institute of Materials Research and Engineering, Agency for Science Technology and Research, 138634 Singapore
  • 4Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 5Center for Spintronics Research Network, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 6Materials Sciences Research Center, Japan Atomic Energy Agency, Sayo, Hyogo 679-5148, Japan
  • 7Department of Physics, National Sun Yat-sen University, Kaohsiung 80424, Taiwan
  • 8Institute of High Performance Computing, Agency for Science, Technology and Research, 138632 Singapore
  • 9Department of Physics, National University of Singapore, 117551 Singapore

Article Text (Subscription Required)

Click to Expand

Supplemental Material (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 4, Iss. 11 — November 2020

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Materials

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×