Nonlocal self-organization of long stacking faults from highly strained nanocomposite film of complex oxide

Tomoya Horide, Manabu Ishimaru, Kazuhisa Sato, and Kaname Matsumoto
Phys. Rev. Materials 3, 013403 – Published 10 January 2019
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Abstract

Elastic strain and defects are important key words for controlling structure and properties in films. While epitaxial strain and misfit dislocations have been discussed in conventional films, the evolution of strain and defect can be significantly varied by nanocomposite strain and complicated defects in oxides. In the present study, long stacking faults with a spacing of 5–30 nm and a length of >500nm were self-organized by ex situ annealing highly strained nanocomposite films of YBa2Cu3O7δ(YBCO)+BaMO3(M=Hf,Sn). It is surprising that the nonlocal nature of stacking faults, namely, the structural correlation over >500nm, was observed in spite of the local configuration of the nanocomposite interface. This kind of structural variation was not observed in the pure YBCO film without nanorods, even when the same annealing was performed. A strain energy analysis showed that the stacking fault formation led to the strain energy minimum by reducing the nanocomposite strain. The layered structure of YBCO stacking faults and the large nanocomposite strain realized the present nonlocal self-organization, which is not observed in the conventional systems with epitaxial strain and misfit dislocations.

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  • Received 7 September 2018
  • Revised 5 November 2018

DOI:https://doi.org/10.1103/PhysRevMaterials.3.013403

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Tomoya Horide1,*, Manabu Ishimaru1, Kazuhisa Sato2,†, and Kaname Matsumoto1

  • 1Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
  • 2Institute for Materials Research, Tohoku University, 2-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

  • *horide@post.matsc.kyutech.ac.jp
  • Present address: Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, 7-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan.

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Vol. 3, Iss. 1 — January 2019

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