Resistivity scaling model for metals with conduction band anisotropy

Miguel De Clercq, Kristof Moors, Kiroubanand Sankaran, Geoffrey Pourtois, Shibesh Dutta, Christoph Adelmann, Wim Magnus, and Bart Sorée
Phys. Rev. Materials 2, 033801 – Published 7 March 2018

Abstract

It is generally understood that the resistivity of metal thin films scales with film thickness mainly due to grain boundary and boundary surface scattering. Recently, several experiments and ab initio simulations have demonstrated the impact of crystal orientation on resistivity scaling. The crystal orientation cannot be captured by the commonly used resistivity scaling models and a qualitative understanding of its impact is currently lacking. In this work, we derive a resistivity scaling model that captures grain boundary and boundary surface scattering as well as the anisotropy of the band structure. The model is applied to Cu and Ru thin films, whose conduction bands are (quasi-) isotropic and anisotropic, respectively. After calibrating the anisotropy with ab initio simulations, the resistivity scaling models are compared to experimental resistivity data and a renormalization of the fitted grain boundary reflection coefficient can be identified for textured Ru.

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  • Received 13 November 2017

DOI:https://doi.org/10.1103/PhysRevMaterials.2.033801

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Miguel De Clercq1, Kristof Moors2,*, Kiroubanand Sankaran3, Geoffrey Pourtois3, Shibesh Dutta3,4, Christoph Adelmann3, Wim Magnus1,3, and Bart Sorée1,3,5

  • 1Physics Department, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium
  • 2Physics and Materials Science Research Unit, University of Luxembourg, Avenue de la Faïencerie 162a, L-1511 Luxembourg, Luxembourg
  • 3imec, Kapeldreef 75, B-3001 Leuven, Belgium
  • 4Department of Physics and Astronomy, KU Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium
  • 5Electrical Engineering (ESAT) Department, KU Leuven, Kasteelpark Arenberg 10, B-3001 Leuven, Belgium

  • *kristof.moors@uni.lu

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Vol. 2, Iss. 3 — March 2018

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