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Ion-gel-gating-induced oxygen vacancy formation in epitaxial La0.5Sr0.5CoO3δ films from in operando x-ray and neutron scattering

Jeff Walter, Guichuan Yu, Biqiong Yu, Alexander Grutter, Brian Kirby, Julie Borchers, Zhan Zhang, Hua Zhou, Turan Birol, Martin Greven, and Chris Leighton
Phys. Rev. Materials 1, 071403(R) – Published 19 December 2017
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Abstract

Ionic-liquid/gel-based transistors have emerged as a potentially ideal means to accumulate high charge-carrier densities at the surfaces of materials such as oxides, enabling control over electronic phase transitions. Substantial gaps remain in the understanding of gating mechanisms, however, particularly with respect to charge carrier vs oxygen defect creation, one contributing factor being the dearth of experimental probes beyond electronic transport. Here we demonstrate the use of synchrotron hard x-ray diffraction and polarized neutron reflectometry as in operando probes of ion-gel transistors based on ferromagnetic La0.5Sr0.5CoO3δ. An asymmetric gate-bias response is confirmed to derive from electrostatic hole accumulation at negative gate bias vs oxygen vacancy formation at positive bias. The latter is detected via a large gate-induced lattice expansion (up to 1%), complementary bulk measurements and density functional calculations enabling quantification of the bias-dependent oxygen vacancy density. Remarkably, the gate-induced oxygen vacancies proliferate through the entire thickness of 30–40-unit-cell-thick films, quantitatively accounting for changes in the magnetization depth profile. These results directly elucidate the issue of electrostatic vs redox-based response in electrolyte-gated oxides, also demonstrating powerful approaches to their in operando investigation.

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  • Received 10 October 2017

DOI:https://doi.org/10.1103/PhysRevMaterials.1.071403

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jeff Walter1, Guichuan Yu2, Biqiong Yu2, Alexander Grutter3, Brian Kirby3, Julie Borchers3, Zhan Zhang4, Hua Zhou4, Turan Birol1, Martin Greven2, and Chris Leighton1,*

  • 1Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, USA
  • 2School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, USA
  • 3NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
  • 4Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA

  • *Corresponding author: leighton@umn.edu

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Issue

Vol. 1, Iss. 7 — December 2017

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