Two-Dimensional Carbon Incorporation into Si(001): C Amount and Structure of Si(001)c(4×4)

Hanchul Kim, Wondong Kim, Geunseop Lee, and Ja-Yong Koo
Phys. Rev. Lett. 94, 076102 – Published 22 February 2005

Abstract

The C amount and the structure of the Si(001)c(4×4) surface is studied using scanning tunneling microscopy (STM) and ab initio calculations. The c(4×4) phase is found to contain 1/8 monolayer C (1 C atom in each primitive unit cell). From the C amount and the symmetry of high-resolution STM images, it is inferred that the C atoms substitute the fourth-layer site below the dimer row. We construct a structure model relying on ab initio energetics and STM simulations. Each C atom induces an on-site dimer vacancy and two adjacent rotated dimers on the same dimer row. The c(4×4) phase constitutes the subsurface Si0.875C0.125 δ layer with two-dimensionally ordered C atoms.

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  • Received 13 October 2004

DOI:https://doi.org/10.1103/PhysRevLett.94.076102

©2005 American Physical Society

Authors & Affiliations

Hanchul Kim1, Wondong Kim1, Geunseop Lee2, and Ja-Yong Koo1

  • 1Korea Research Institute of Standards and Science, P.O. Box 102, Yuseong, Daejeon 305-600, Korea
  • 2Department of Physics, Inha University, Inchon 402-751, Korea

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Vol. 94, Iss. 7 — 25 February 2005

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