Multiple Time Scale Simulations of Metal Crystal Growth Reveal the Importance of Multiatom Surface Processes

Graeme Henkelman and Hannes Jónsson
Phys. Rev. Lett. 90, 116101 – Published 21 March 2003

Abstract

A method for extending atomistic computer simulations of solids beyond the nanosecond time scale was used to simulate metal crystal growth on the time scale of laboratory experiments. Transitions involving concerted motion of multiple atoms on the crystal surface are found to lead to remarkably smooth growth of pure Al(100). Cu(100) is found to grow with a rougher surface, consistent with experiments. Not only is the activation energy of the multiatom Al processes surprisingly low, but vibrational entropy also favors processes where many atoms are displaced.

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  • Received 27 November 2002

DOI:https://doi.org/10.1103/PhysRevLett.90.116101

©2003 American Physical Society

Authors & Affiliations

Graeme Henkelman1,2 and Hannes Jónsson1,3

  • 1Department of Chemistry 351700, University of Washington, Seattle, Washington 98195-1700
  • 2Theoretical Division, Los Alamos National Lab, Los Alamos, New Mexico 87545
  • 3Faculty of Science, VR-II, University of Iceland, 107 Reykjavík, Iceland

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Issue

Vol. 90, Iss. 11 — 21 March 2003

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