Abstract
The report that was doubled in underdoped films under compressive epitaxial strain has stirred great interest. We show that such films are extremely sensitive to oxygen intake, even at very low temperature, with startling consequences including colossal lattice expansion and a crossover from semiconductor to metallic behavior. We can bring up to 40 K in films on substrates—without any Sr doping and under tensile strain. On substrates, we reached , the highest so far in .
- Received 15 March 2002
DOI:https://doi.org/10.1103/PhysRevLett.89.107001
©2002 American Physical Society