Phys. Rev. Lett. 86, 1389 (2001) - Comment on ``Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit''

Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”

Girish S. Agarwal, Robert W. Boyd, Elna M. Nagasako, and Sean J. Bentley

Phys. Rev. Lett. 86, 1389 – Published 12 February 2001

Abstract

A Comment on the Letter by Agedi N. Boto, et al., Phys. Rev. Lett. 85, 2733 (2000).

Received 18 October 2000

DOI:https://doi.org/10.1103/PhysRevLett.86.1389

©2001 American Physical Society

Authors & Affiliations

Girish S. Agarwal

Physical Research Laboratory Navrangpura Ahmedabad-380 009, India

Robert W. Boyd, Elna M. Nagasako, and Sean J. Bentley

The Institute of Optics University of Rochester Rochester, New York 14627

Original Article

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, and Jonathan P. Dowling

Phys. Rev. Lett. 85, 2733 (2000)

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Vol. 86, Iss. 7 — 12 February 2001

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