Dislocation Scattering in GaN

D. C. Look and J. R. Sizelove
Phys. Rev. Lett. 82, 1237 – Published 8 February 1999
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Abstract

A theory of charged-dislocation-line scattering is developed within the framework of the Boltzmann transport equation. A fit of the theory to temperature-dependent Hall-effect data in GaN gives dislocation densities which are in excellent agreement with those measured by transmission electron microscopy. This work shows that threading edge dislocations in GaN indeed are electrically active, in agreement with recent theoretical predictions.

  • Received 4 September 1998

DOI:https://doi.org/10.1103/PhysRevLett.82.1237

©1999 American Physical Society

Authors & Affiliations

D. C. Look

  • Semiconductor Research Center, Wright State University, Dayton, Ohio 45435

J. R. Sizelove

  • Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433

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Vol. 82, Iss. 6 — 8 February 1999

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