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Site-Selective Reaction of Br2 with Second Layer Ga Atoms on the As-rich GaAs(001)2×4 Surface

Yong Liu, Andrew J. Komrowski, and Andrew C. Kummel
Phys. Rev. Lett. 81, 413 – Published 13 July 1998
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Abstract

The top layer of the GaAs(001)(2×4) surface consists of rows of As-As dimers. However, our scanning tunneling microscopy study shows that, in the initial adsorption stage, monoenergetic Br2 molecules (0.89 eV) react exclusively with the second layer Ga atoms exposed in trenches or at defects on the surface. A simple molecular orbital argument was used to explain the dynamics of forming gallium bromide species at various surface Ga sites.

  • Received 3 February 1998

DOI:https://doi.org/10.1103/PhysRevLett.81.413

©1998 American Physical Society

Authors & Affiliations

Yong Liu, Andrew J. Komrowski, and Andrew C. Kummel*

  • Department of Chemistry, 0358, University of California at San Diego, 9500 Gilman Drive, La Jolla, California 92093

  • *Corresponding author.Electronic address: akummel@ucsd.edu

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Vol. 81, Iss. 2 — 13 July 1998

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