Direct comparison of the quantized Hall resistance in gallium arsenide and silicon

A. Hartland, K. Jones, J. M. Williams, B. L. Gallagher, and T. Galloway
Phys. Rev. Lett. 66, 969 – Published 25 February 1991
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Abstract

Using an ultrasensitive, cryogenic, current-comparator bridge the quantized Hall resistance RH(2) in a GaAs/AlGaAs heterostructure has been compared directly with RH(4) in a silicon MOSFET. The measurements show that RH(2;GaAs)/RH(4;Si)=2[1-0.22(3.5)×1010]. Within the 1σ combined uncertainty of ±3.5×1010 the result suggests that the quantized Hall resistance is a universal quantity, independent of the host lattice and Landau-level index, and is probably equivalent to h/e2, the relationship predicted theoretically.

  • Received 16 November 1990

DOI:https://doi.org/10.1103/PhysRevLett.66.969

©1991 American Physical Society

Authors & Affiliations

A. Hartland, K. Jones, and J. M. Williams

  • National Physical Laboratory, Teddington TW11 OLW, United Kingdom

B. L. Gallagher and T. Galloway

  • Department of Physics, The University, Nottingham NG7 2RD, United Kingdom

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Vol. 66, Iss. 8 — 25 February 1991

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