Abstract
X-ray diffraction of silicon irradiated with tightly focused femtosecond x-ray pulses (photon energy, 11.5 keV; pulse duration, 6 fs) was measured at various x-ray intensities up to . The measurement reveals that the diffraction intensity is highly suppressed when the x-ray intensity reaches of the order of . With a dedicated simulation, we confirm that the observed reduction of the diffraction intensity can be attributed to the femtosecond change in individual atomic scattering factors due to the ultrafast creation of highly ionized atoms through photoionization, Auger decay, and subsequent collisional ionization. We anticipate that this ultrafast reduction of atomic scattering factor will be a basis for new x-ray nonlinear techniques, such as pulse shortening and contrast variation x-ray scattering.
- Received 13 April 2023
- Revised 18 August 2023
- Accepted 28 August 2023
DOI:https://doi.org/10.1103/PhysRevLett.131.163201
© 2023 American Physical Society
Physics Subject Headings (PhySH)
synopsis
Intense X Rays Can Free Bound Electrons
Published 17 October 2023
Measurements indicate that intense x-ray pulses can change the electronic structure of a material on femtosecond timescales, a finding that could improve imaging of light–matter interactions.
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