Using Nonequilibrium Dynamics to Probe Competing Orders in a Mott-Peierls System

Y. Wang, B. Moritz, C.-C. Chen, C. J. Jia, M. van Veenendaal, and T. P. Devereaux
Phys. Rev. Lett. 116, 086401 – Published 24 February 2016
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Abstract

Competition between ordered phases, and their associated phase transitions, are significant in the study of strongly correlated systems. Here, we examine one aspect, the nonequilibrium dynamics of a photoexcited Mott-Peierls system, using an effective Peierls-Hubbard model and exact diagonalization. Near a transition where spin and charge become strongly intertwined, we observe antiphase dynamics and a coupling-strength-dependent suppression or enhancement in the static structure factors. The renormalized bosonic excitations coupled to a particular photoexcited electron can be extracted, which provides an approach for characterizing the underlying bosonic modes. The results from this analysis for different electronic momenta show an uneven softening due to a stronger coupling near kF. This behavior reflects the strong link between the fermionic momenta, the coupling vertices, and ultimately, the bosonic susceptibilities when multiple phases compete for the ground state of the system.

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  • Received 12 November 2015

DOI:https://doi.org/10.1103/PhysRevLett.116.086401

© 2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Y. Wang1,2, B. Moritz2,3, C.-C. Chen4, C. J. Jia2, M. van Veenendaal4,5, and T. P. Devereaux2,6

  • 1Department of Applied Physics, Stanford University, Stanford, California 94305, USA
  • 2SLAC National Accelerator Laboratory, Stanford Institute for Materials and Energy Sciences, 2575 Sand Hill Road, Menlo Park, California 94025, USA
  • 3Department of Physics and Astrophysics, University of North Dakota, Grand Forks, North Dakota 58202, USA
  • 4Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 5Department of Physics, Northern Illinois University, De Kalb, Illinois 60115, USA
  • 6Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA

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Issue

Vol. 116, Iss. 8 — 26 February 2016

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