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Total-Reflection Inelastic X-Ray Scattering from a 10-nm Thick La0.6Sr0.4CoO3 Thin Film

T. T. Fister, D. D. Fong, J. A. Eastman, H. Iddir, P. Zapol, P. H. Fuoss, M. Balasubramanian, R. A. Gordon, K. R. Balasubramaniam, and P. A. Salvador
Phys. Rev. Lett. 106, 037401 – Published 18 January 2011
Physics logo See Synopsis: X-raying the skin

Abstract

To study equilibrium changes in composition, valence, and electronic structure near the surface and into the bulk, we demonstrate the use of a new approach, total-reflection inelastic x-ray scattering, as a sub-keV spectroscopy capable of depth profiling chemical changes in thin films with nanometer resolution. By comparing data acquired under total x-ray reflection and penetrating conditions, we are able to separate the O K-edge spectra from a 10 nm La0.6Sr0.4CoO3 thin film from that of the underlying SrTiO3 substrate. With a smaller wavelength probe than comparable soft x-ray absorption measurements, we also describe the ability to easily access dipole-forbidden final states, using the dramatic evolution of the La N4,5 edge with momentum transfer as an example.

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  • Received 17 November 2009

DOI:https://doi.org/10.1103/PhysRevLett.106.037401

© 2011 The American Physical Society

Synopsis

Key Image

X-raying the skin

Published 3 February 2011

A new form of x-ray spectroscopy uses total external reflection to reveal the chemical evolution of a surface into a bulk material.

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Authors & Affiliations

T. T. Fister*, D. D. Fong, J. A. Eastman, H. Iddir, P. Zapol, and P. H. Fuoss

  • Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA

M. Balasubramanian

  • Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA

R. A. Gordon

  • Department of Physics, Simon Fraser University, Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA

K. R. Balasubramaniam and P. A. Salvador

  • Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA

  • *fister@anl.gov

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Issue

Vol. 106, Iss. 3 — 21 January 2011

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