Abstract
We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.
- Received 3 May 2010
DOI:https://doi.org/10.1103/PhysRevLett.105.183601
© 2010 The American Physical Society
Synopsis
Finer features
Published 25 October 2010
A two-step process could improve the resolution of optical lithography.
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