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Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations

Zeyang Liao, M. Al-Amri, and M. Suhail Zubairy
Phys. Rev. Lett. 105, 183601 – Published 25 October 2010
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Abstract

We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.

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  • Received 3 May 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.183601

© 2010 The American Physical Society

Synopsis

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Finer features

Published 25 October 2010

A two-step process could improve the resolution of optical lithography.

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Authors & Affiliations

Zeyang Liao1, M. Al-Amri2, and M. Suhail Zubairy1

  • 1Institute for Quantum Studies and Department of Physics and Astronomy, Texas A&M University, College Station, Texas 77843-4242, USA
  • 2The National Center for Mathematics and Physics, KACST, P.O. Box 6086, Riyadh 11442, Saudi Arabia

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Issue

Vol. 105, Iss. 18 — 29 October 2010

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