Abstract
We present a quantum-accurate multiscale study of how hydrogen-filled discoidal “platelet” defects grow inside a silicon crystal. Dynamical simulations of a 10-nm-diameter platelet reveal that molecules form at its internal surfaces, diffuse, and dissociate at its perimeter, where they both induce and stabilize the breaking up of highly stressed silicon bonds. A buildup of internal pressure is neither needed for nor allowed by this stress-corrosion growth mechanism, at odds with previous models. Slow platelet growth up to micrometric sizes is predicted as a consequence, making atomically smooth crystal cleavage possible in implantation experiments.
- Received 12 February 2010
DOI:https://doi.org/10.1103/PhysRevLett.105.075502
© 2010 The American Physical Society