Dimensional-Crossover-Driven Metal-Insulator Transition in SrVO3 Ultrathin Films

K. Yoshimatsu, T. Okabe, H. Kumigashira, S. Okamoto, S. Aizaki, A. Fujimori, and M. Oshima
Phys. Rev. Lett. 104, 147601 – Published 9 April 2010

Abstract

We have investigated the changes occurring in the electronic structure of digitally controlled SrVO3 ultrathin films across the metal-insulator transition (MIT) by the film thickness using in situ photoemission spectroscopy. With decreasing film thickness, a pseudogap is formed at EF through spectral weight transfer from the coherent part to the incoherent part. The pseudogap finally evolves into an energy gap that is indicative of the MIT in a SrVO3 ultrathin film. The observed spectral behavior is reproduced by layer dynamical-mean-field-theory calculations, and it indicates that the observed MIT is caused by the reduction in the bandwidth due to the dimensional crossover.

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  • Received 12 November 2009

DOI:https://doi.org/10.1103/PhysRevLett.104.147601

©2010 American Physical Society

Authors & Affiliations

K. Yoshimatsu1, T. Okabe1, H. Kumigashira1,2,3,*, S. Okamoto4, S. Aizaki5, A. Fujimori5, and M. Oshima1,3,6

  • 1Department of Applied Chemistry, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 2PRESTO, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
  • 3Synchrotron Radiation Research Organization, The University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 4Oak Ridge National Laboratory, Oak Ridge Tennessee 37831-6071, USA
  • 5Department of Physics, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
  • 6CREST, Japan Science and Technology Agency, Bunkyo-ku, Tokyo 113-8656, Japan

  • *kumigashira@sr.t.u-tokyo.ac.jp

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Issue

Vol. 104, Iss. 14 — 9 April 2010

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