Enhanced Donor Binding Energy Close to a Semiconductor Surface

A. P. Wijnheijmer, J. K. Garleff, K. Teichmann, M. Wenderoth, S. Loth, R. G. Ulbrich, P. A. Maksym, M. Roy, and P. M. Koenraad
Phys. Rev. Lett. 102, 166101 – Published 21 April 2009

Abstract

We measured the ionization threshold voltage of individual impurities close to a semiconductor-vacuum interface, where we use the STM tip to ionize individual donors. We observe a reversed order of ionization with depth below the surface, which proves that the binding energy is enhanced towards the surface. This is in contrast to the predicted reduction for a Coulombic impurity in the effective mass approach. We can estimate the binding energy from the ionization threshold and show experimentally that in the case of silicon doped gallium arsenide the binding energy gradually increases over the last 1.2 nm below the (110) surface.

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  • Received 25 November 2008

DOI:https://doi.org/10.1103/PhysRevLett.102.166101

©2009 American Physical Society

Authors & Affiliations

A. P. Wijnheijmer1,*, J. K. Garleff1, K. Teichmann2, M. Wenderoth2, S. Loth2, R. G. Ulbrich2, P. A. Maksym3, M. Roy3, and P. M. Koenraad1

  • 1COBRA Inter-University Research Institute, Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The Netherlands
  • 2IV. Physikalisches Institut, Universität Göttingen, F.-Hund-Platz 1, 37077 Göttingen, Germany
  • 3Department of Physics and Astronomy, University of Leicester, University Road, Leicester LE1 7RH, United Kingdom

  • *a.p.wijnheijmer@tue.nl

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Vol. 102, Iss. 16 — 24 April 2009

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