Self-organized dip-coating patterns of simple, partially wetting, nonvolatile liquids

Walter Tewes, Markus Wilczek, Svetlana V. Gurevich, and Uwe Thiele
Phys. Rev. Fluids 4, 123903 – Published 13 December 2019

Abstract

When a solid substrate is withdrawn from a bath of simple, partially wetting, nonvolatile liquid, one typically distinguishes two regimes, namely, after withdrawal the substrate is macroscopically dry or homogeneously coated by a liquid film. In the latter case, the coating is called a Landau–Levich film. Its thickness depends on the angle and velocity of substrate withdrawal. We predict by means of a numerical and analytical investigation of a hydrodynamic thin-film model the existence of a third regime. It consists of the deposition of a regular pattern of liquid ridges oriented parallel to the meniscus. We establish that the mechanism of the underlying meniscus instability originates from competing film dewetting and Landau–Levich film deposition and argue that the mechanism also occurs for other combinations of film instability and lateral driving. Our analysis combines a marginal stability analysis, numerical time simulations and a numerical bifurcation study via path-continuation.

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  • Received 11 June 2019

DOI:https://doi.org/10.1103/PhysRevFluids.4.123903

©2019 American Physical Society

Physics Subject Headings (PhySH)

Fluid DynamicsNonlinear Dynamics

Authors & Affiliations

Walter Tewes1,*, Markus Wilczek1,2, Svetlana V. Gurevich1,2, and Uwe Thiele1,2,†

  • 1Institut für Theoretische Physik, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Strasse 9, 48149 Münster, Germany
  • 2Center for Nonlinear Science (CeNoS), Westfälische Wilhelms-Universität Münster, Corrensstrasse 2, 48149 Münster, Germany

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Vol. 4, Iss. 12 — December 2019

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