Charge equilibration in integer and fractional quantum Hall edge channels in a generalized Hall-bar device

Chaojing Lin, Ryota Eguchi, Masayuki Hashisaka, Takafumi Akiho, Koji Muraki, and Toshimasa Fujisawa
Phys. Rev. B 99, 195304 – Published 13 May 2019

Abstract

Charge equilibration between quantum Hall edge states can be studied to reveal the geometric structure of edge channels not only in the integer quantum Hall (IQH) regime but also in the fractional quantum Hall (FQH) regime, particularly for hole-conjugate states. Here we report on a systematic study of charge equilibration in both IQH and FQH regimes by using a generalized Hall bar, in which a quantum Hall state is nested in another quantum Hall state with different Landau filling factors. This provides a feasible way to evaluate equilibration in various conditions even in the presence of scattering in the bulk region. The validity of the analysis is tested in the IQH regime by confirming consistency with previous works. In the FQH regime, we find that the equilibration length for counterpropagating δν=1 and δν=1/3 channels along a hole-conjugate state at Landau filling factor ν=2/3 is much shorter than that for copropagating δν=1 and δν=1/3 channels along a particle state at ν=4/3. The difference can be associated with the distinct geometric structures of the edge channels. Our analysis with generalized Hall-bar devices would be useful in studying edge equilibration and edge structures.

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  • Received 30 January 2019
  • Revised 20 April 2019

DOI:https://doi.org/10.1103/PhysRevB.99.195304

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Chaojing Lin1,*, Ryota Eguchi1, Masayuki Hashisaka1,2, Takafumi Akiho2, Koji Muraki2, and Toshimasa Fujisawa1

  • 1Department of Physics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-8551, Japan
  • 2NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi 243-0198, Japan

  • *lin.c.ad@m.titech.ac.jp

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Vol. 99, Iss. 19 — 15 May 2019

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