Modifying the geometric and electronic structure of hexagonal boron nitride on Ir(111) by Cs adsorption and intercalation

Jiaqi Cai, Wouter Jolie, Caio C. Silva, Marin Petrović, Christoph Schlueter, Thomas Michely, Marko Kralj, Tien-Lin Lee, and Carsten Busse
Phys. Rev. B 98, 195443 – Published 28 November 2018

Abstract

Epitaxial hexagonal boron nitride on Ir(111) is significantly modified by adsorption and intercalation of alkali-metal atoms. Regarding geometry, intercalation lifts the two-dimensional layer from its substrate and reduces the characteristic corrugation imprinted by direct contact with the metal substrate. Moreover, the presence of charged species in close proximity to the hexagonal boron nitride (hBN) layer strongly shifts the electronic structure (valence bands and core levels). We used scanning tunneling microscopy, low-energy electron diffraction, x-ray photoelectron spectroscopy (XPS), and the x-ray standing wave technique to study changes in the atomic structure induced by Cs adsorption and intercalation. Depending on the preparation, the alkali-metal atoms can be found on top and underneath the hexagonal boron nitride in ordered and disordered arrangements. Adsorbed Cs does not change the morphology of hBN/Ir(111) significantly, whereas an intercalated layer of Cs decouples the two-dimensional sheet and irons out its corrugation. XPS and angle-resolved photoelectron spectroscopy reveal a shift of the electronic states to higher binding energies, which increases with increasing density of the adsorbed and intercalated Cs. In the densest phase, Cs both intercalates and adsorbs on hBN and shifts the electronic states of hexagonal boron nitride by 3.56 eV. As this shift is not sufficient to move the conduction band below the Fermi energy, the electronic band gap must be larger than 5.85 eV.

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  • Received 14 June 2018
  • Revised 18 October 2018

DOI:https://doi.org/10.1103/PhysRevB.98.195443

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jiaqi Cai1,2,3, Wouter Jolie2, Caio C. Silva1,2, Marin Petrović4, Christoph Schlueter5, Thomas Michely2, Marko Kralj4, Tien-Lin Lee5, and Carsten Busse1,2,3,*

  • 1Institut für Materialphysik, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Straße 10, 48149 Münster, Germany
  • 2II. Physikalisches Institut, Universität zu Köln, Zülpicher Straße 77, 50937 Köln, Germany
  • 3Department Physik, Universität Siegen, Walter-Flex-Straße 3, 57068 Siegen, Germany
  • 4Center of Excellence for Advanced Materials and Sensing Devices, Institute of Physics, Bijenička 46, 10000 Zagreb, Croatia
  • 5Diamond Light Source, Didcot OX11 0DE, Oxfordshire, United Kingdom

  • *carsten.busse@uni-siegen.de

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Issue

Vol. 98, Iss. 19 — 15 November 2018

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