Comparative study of the pressure dependence of optical-phonon transverse-effective charges and linewidths in wurtzite InN

J. S. Reparaz, K. Pereira da Silva, A. H. Romero, J. Serrano, M. R. Wagner, G. Callsen, S. J. Choi, J. S. Speck, and A. R. Goñi
Phys. Rev. B 98, 165204 – Published 16 October 2018

Abstract

We investigate the hydrostatic pressure dependence of the zone center optical phonons of c-plane and a-plane wurtzite InN epilayers grown on GaN substrates. The longitudinal to transverse mode splitting for the A1 and E1 modes was found to increase with increasing pressure, whereas the associated transverse effective charge decreases for both modes as eT*(A1)=2.939.9×103P and eT*(E1)=2.8010.6×103P (in units of elementary charge and P in GPa). These observations are well in line with results for other II–VI, III–V, and group-IV semiconductor compounds as far as the relation between the magnitude and sign of the pressure derivative of eT* and the bond ionicity is concerned. As the latter increases so does |eT*/P| with a sign change from positive to negative for bond ionicities around fi=0.46 for compounds with anions belonging to the first row of the Periodic Table. A comparison of the results for InN and other nine tetrahedrally bonded compounds indicate that the pressure behavior of the transverse effective charge is mainly determined by the strength of the Pauli repulsion between cation valence electrons and those of the anion core. We also perform ab initio calculations in order to address the origin of the observed increase in linewidth of the E2high mode which is found to arise from a pressure-induced increase in the rate of two-phonon decay processes. This broadening is associated with tuning into resonance of a steep edge in the two-phonon density of states around 460 cm1 with the frequency of the E2high mode.

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  • Received 20 June 2017
  • Revised 9 July 2018

DOI:https://doi.org/10.1103/PhysRevB.98.165204

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

J. S. Reparaz1,*, K. Pereira da Silva1,2, A. H. Romero3,4, J. Serrano5, M. R. Wagner6, G. Callsen6, S. J. Choi7, J. S. Speck7, and A. R. Goñi1,8,†

  • 1Institut de Ciència de Materials de Barcelona-CSIC, Esfera UAB, 08193 Bellaterra, Spain
  • 2Faculdade de Física, Universidade Federal do Pará, CEP 66075-110, Belém, Pará, Brazil
  • 3Physics Department, West Virginia University, Morgantown, West Virginia 26506, USA
  • 4Facultad de Ingeniería, Benemérita Universidad Autónoma de Puebla, 72570 Puebla, Puebla, Mexico
  • 5Yachay Tech University, School of Physical Sciences and Nanotechnology, Urcuqu 100119, Ecuador
  • 6Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstrasse 36, 10623 Berlin, Germany
  • 7Materials Department, University of California, Santa Barbara, California 93106-5050, USA
  • 8ICREA, Passeig Lluís Companys 23, 08010 Barcelona, Spain

  • *Corresponding author: jsreparaz@icmab.es
  • Corresponding author: goni@icmab.es

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Issue

Vol. 98, Iss. 16 — 15 October 2018

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