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Weak antilocalization induced by Rashba spin-orbit interaction in layered III-VI compound semiconductor GaSe thin films

Shoichi Takasuna, Junichi Shiogai, Shunichiro Matsuzaka, Makoto Kohda, Yutaka Oyama, and Junsaku Nitta
Phys. Rev. B 96, 161303(R) – Published 30 October 2017
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Abstract

Magnetoconductance (MC) at low temperature was measured to investigate spin-related transport affected by spin-orbit interaction (SOI) in III-VI compound n-type GaSe thin films. Results reveal that MC shows weak antilocalization (WAL). Its temperature and gate voltage dependences reveal that the dominant spin relaxation is governed by the D’yakonov-Perel’ mechanism associated with the Rashba SOI. The estimated Rashba SOI strength in GaSe is much stronger than that of III-V compound GaAs quantum wells, although the energy gap and spin split-off band in GaSe closely resemble those in GaAs. The angle dependence of WAL amplitude in the in-plane magnetic field direction is almost isotropic. This isotropy indicates that the strength of the Dresselhaus SOI is negligible compared with the Rashba SOI strength. The SOI effect in n-GaSe thin films differs greatly from those of III-V compound semiconductors and transition-metal dichalcogenides.

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  • Received 18 May 2017
  • Revised 11 September 2017

DOI:https://doi.org/10.1103/PhysRevB.96.161303

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Shoichi Takasuna1, Junichi Shiogai1,2, Shunichiro Matsuzaka3, Makoto Kohda1,4, Yutaka Oyama1, and Junsaku Nitta1,4

  • 1Department of Materials Science, Tohoku University, Sendai 980-8579, Japan
  • 2Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
  • 3Nanophoton R&D Center, Nanophoton Corporation, Osaka 565-0871, Japan
  • 4Center for Spintronics Research Network, Tohoku University, Sendai 980-8579, Japan

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Issue

Vol. 96, Iss. 16 — 15 October 2017

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