Gate tunable spin-orbit coupling and weak antilocalization effect in an epitaxial La2/3Sr1/3MnO3 thin film

Shao-Pin Chiu, Michihiko Yamanouchi, Tatsuro Oyamada, Hiromichi Ohta, and Juhn-Jong Lin
Phys. Rev. B 96, 085143 – Published 28 August 2017

Abstract

Epitaxial La2/3Sr1/3MnO3 (LSMO) films have been grown on SrTiO3 (001) substrates via pulsed laser deposition. In a 22-nm-thick LSMO film with a low residual resistivity of ρ059μΩcm, we found a zero-field dip in the magnetoresistance (MR) below 10 K, manifesting the weak antilocalization (WAL) effect due to strong spin-orbit coupling (SOC). We have analyzed the MR data by including the D’yakonov-Perel’ spin-relaxation mechanism in the WAL theory. We explain that the delocalized spin-down electron sub-band states play a crucial role for facilitating marked SOC in clean LSMO. Moreover, we find that the SOC strength and gate voltage tunability are similar to those in a two-dimensional electron gas at the LaAlO3/SrTiO3 interface, indicating the presence of an internal electric field near the LSMO/SrTiO3 interface. In a control measurement on a 5-nm-thick high resistivity (ρ0280μΩcm) LSMO film, we observe only a small zero-field peak in MR from weak localization effect, indicating negligible SOC.

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  • Received 24 April 2017
  • Revised 12 July 2017

DOI:https://doi.org/10.1103/PhysRevB.96.085143

©2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Shao-Pin Chiu1,*, Michihiko Yamanouchi2,3, Tatsuro Oyamada3, Hiromichi Ohta2,3, and Juhn-Jong Lin1,4

  • 1Institute of Physics, National Chiao Tung University, Hsinchu 30010, Taiwan
  • 2Research Institute for Electronic Science, Hokkaido University, N20W10, Kita, Sapporo 001-0020, Japan
  • 3Graduate School of Information Science and Technology, Hokkaido University, N14W19, Kita, Sapporo 060-0814, Japan
  • 4Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan

  • *fluentbb@gmail.com

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Issue

Vol. 96, Iss. 8 — 15 August 2017

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