Intrinsic high electrical conductivity of stoichiometric SrNbO3 epitaxial thin films

Daichi Oka, Yasushi Hirose, Shoichiro Nakao, Tomoteru Fukumura, and Tetsuya Hasegawa
Phys. Rev. B 92, 205102 – Published 2 November 2015

Abstract

SrVO3 and SrNbO3 are perovskite-type transition-metal oxides with the same d1 electronic configuration. Although SrNbO3 (4d1) has a larger d orbital than SrVO3 (3d1), the reported electrical resistivity of SrNbO3 is much higher than that of SrVO3, probably owing to nonstoichiometry. In this paper, we grew epitaxial, high-conductivity stoichiometric SrNbO3 using pulsed laser deposition. The growth temperature strongly affected the Sr/Nb ratio and the oxygen content of the films, and we obtained stoichiometric SrNbO3 at a very narrow temperature window around 630 °C. The stoichiometric SrNbO3 epitaxial thin films grew coherently on KTaO3 (001) substrates with high crystallinity. The room-temperature resistivity of the stoichiometric film was 2.82×105Ωcm, one order of magnitude lower than the lowest reported value of SrNbO3 and comparable with that of SrVO3. We observed a T-square dependence of resistivity below T*=180K and non-Drude behavior in near-infrared absorption spectroscopy, attributable to the Fermi-liquid nature caused by electron correlation. Analysis of the T-square coefficient A of resistivity experimentally revealed that the 4d orbital of Nb that is larger than the 3d ones certainly contributes to the high electrical conduction of SrNbO3.

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  • Received 10 July 2015
  • Revised 5 October 2015

DOI:https://doi.org/10.1103/PhysRevB.92.205102

©2015 American Physical Society

Authors & Affiliations

Daichi Oka1,2, Yasushi Hirose1,3,4,*, Shoichiro Nakao3,4, Tomoteru Fukumura1,2,4, and Tetsuya Hasegawa1,3,4

  • 1Department of Chemistry, School of Science, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-0033, Japan
  • 2Department of Chemistry, Graduate School of Science, Tohoku University, 6-3 Azaaoba, Aramaki, Aoba, Sendai 980-8578, Japan
  • 3Kanagawa Academy of Science and Technology (KAST), 3-2-1 Sakado, Takatsu, Kawasaki 213-0012, Japan
  • 4CREST, Japan Science and Technology Agency, 7-3-1 Hongo, Bunkyo, Tokyo 113-0033, Japan

  • *Corresponding author: hirose@chem.s.u-tokyo.ac.jp

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Issue

Vol. 92, Iss. 20 — 15 November 2015

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