Evidence of extreme type-III band offset at buried n-type CdO/p-type SnTe interfaces

M. J. Wahila, Z. W. Lebens-Higgins, N. F. Quackenbush, J. Nishitani, W. Walukiewicz, P.-A. Glans, J.-H. Guo, J. C. Woicik, K. M. Yu, and L. F. J. Piper
Phys. Rev. B 91, 205307 – Published 18 May 2015

Abstract

At covalent semiconductor interfaces, the band alignment is determined by the location of the band edges with respect to the charge neutrality level, but extension of this method to more ionic semiconductor systems requires further consideration. Using the charge neutrality level concept, a type-III (or broken band gap) band offset is predicted at the interface between n-type CdO and p-type SnTe. Employing hard x-ray photoelectron spectroscopy, we report on the chemical composition at the buried interface and the valence-band offset. Chemical intermixing at the interface between SnTe and CdO is found to be limited to 2.5 nm in our heterojunction samples. We measure a valence-band offset of 1.95(±0.15 eV) irrespective of the layer configuration. Once the degenerate hole doping of the SnTe is considered, the measured band-edge offset agrees with the type-III offset predicted from alignment of the band edges with respect to the charge neutrality level of the semiconductors.

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  • Received 12 February 2015
  • Revised 20 March 2015

DOI:https://doi.org/10.1103/PhysRevB.91.205307

©2015 American Physical Society

Authors & Affiliations

M. J. Wahila1, Z. W. Lebens-Higgins1, N. F. Quackenbush1, J. Nishitani2,3, W. Walukiewicz2, P.-A. Glans4, J.-H. Guo4, J. C. Woicik5, K. M. Yu2,6, and L. F. J. Piper1,*

  • 1Department of Physics, Applied Physics and Astronomy, Binghamton University, Binghamton, New York 13902, USA
  • 2Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 3Institute for Solid State Physics, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa-shi, Chiba 277-8581, Japan
  • 4Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 5Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
  • 6Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong Kong SAR, China

  • *lpiper@binghamton.edu

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Issue

Vol. 91, Iss. 20 — 15 May 2015

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