Abstract
Motivated by a recent experiment that reported the successful synthesis of hexagonal AlN [Tsipas et al., Appl. Phys. Lett. 103, 251605 (2013)], we investigate structural, electronic, and vibrational properties of bulk, bilayer, and monolayer structures of -AlN by using first-principles calculations. We show that the hexagonal phase of the bulk -AlN is a stable direct-band-gap semiconductor. The calculated phonon spectrum displays a rigid-layer shear mode at and an mode at , which are observable by Raman measurements. In addition, single-layer -AlN is an indirect-band-gap semiconductor with a nonmagnetic ground state. For the bilayer structure, -type stacking is found to be the most favorable one, and interlayer interaction is strong. While -layered -AlN is an indirect-band-gap semiconductor for , we predict that thicker structures have a direct band gap at the point. The number-of-layer-dependent band-gap transitions in -AlN is interesting in that it is significantly different from the indirect-to-direct crossover obtained in the transition-metal dichalcogenides.
- Received 5 November 2014
- Revised 11 February 2015
DOI:https://doi.org/10.1103/PhysRevB.91.085430
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