Intra- and interband electron scattering in a hybrid topological insulator: Bismuth bilayer on Bi2Se3

A. Eich, M. Michiardi, G. Bihlmayer, X.-G. Zhu, J.-L. Mi, Bo B. Iversen, R. Wiesendanger, Ph. Hofmann, A. A. Khajetoorians, and J. Wiebe
Phys. Rev. B 90, 155414 – Published 8 October 2014

Abstract

The band structure and intra- and interband scattering processes of the electrons at the surface of a bismuth bilayer on Bi2Se3 have been experimentally investigated by low-temperature Fourier-transform scanning tunneling spectroscopy. The observed complex quasiparticle interference patterns are compared to a simulation based on the spin-dependent joint density of states approach using the surface-localized spectral function calculated from first principles as the only input. Thereby, the origin of the quasiparticle interferences can be traced back to intraband scattering in the bismuth-bilayer valence band and Bi2Se3 conduction band and to interband scattering between the two-dimensional topological state and the bismuth-bilayer valence band. The investigation reveals that the bilayer band gap, which is predicted to host one-dimensional topological states at the edges of the bilayer, is pushed several hundred meV above the Fermi level. This result is rationalized by an electron transfer from the bilayer to Bi2Se3 which also leads to a two-dimensional electron state in the Bi2Se3 conduction band with a strong Rashba spin splitting, coexisting with the topological state and bilayer valence band.

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  • Received 16 July 2014
  • Revised 8 September 2014

DOI:https://doi.org/10.1103/PhysRevB.90.155414

©2014 American Physical Society

Authors & Affiliations

A. Eich1,*, M. Michiardi2,*, G. Bihlmayer3, X.-G. Zhu2, J.-L. Mi4, Bo B. Iversen4, R. Wiesendanger1, Ph. Hofmann2, A. A. Khajetoorians1,5,†, and J. Wiebe1,‡

  • 1Institute for Applied Physics, Universität Hamburg, D-20355 Hamburg, Germany
  • 2Department of Physics and Astronomy, Interdisciplinary Nanoscience Center (iNANO), Aarhus University, DK-8000 Aarhus C, Denmark
  • 3Institute for Advanced Simulation and Peter Grünberg Institut, Forschungszentrum Jülich and JARA, 52425 Jülich, Germany
  • 4Center for Materials Crystallography, Department of Chemistry, Interdisciplinary Nanoscience Center (iNANO), Aarhus University, DK 8000 Aarhus C, Denmark
  • 5Institute for Molecules and Materials (IMM), Radboud University, 6525 AJ Nijmegen, The Netherlands

  • *These authors have contributed equally to this work.
  • Corresponding author: akhajeto@physnet.uni-hamburg.de
  • jwiebe@physnet.uni-hamburg.de

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Issue

Vol. 90, Iss. 15 — 15 October 2014

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