Abstract
Using scanning tunneling microscopy and ab initio simulations, we have identified several configurations for Cu dopants in , with Cu intercalants being the most abundant. Through statistical analysis, we show strong short-range repulsive interactions between Cu intercalants. At intermediate range (>5 nm), the pair distribution function shows oscillatory structure along the directions, which appear to be influenced by different diffusion barriers along the and directions.
- Received 29 October 2013
- Revised 1 April 2014
DOI:https://doi.org/10.1103/PhysRevB.89.155312
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