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Controlled growth of a line defect in graphene and implications for gate-tunable valley filtering

J.-H. Chen, G. Autès, N. Alem, F. Gargiulo, A. Gautam, M. Linck, C. Kisielowski, O. V. Yazyev, S. G. Louie, and A. Zettl
Phys. Rev. B 89, 121407(R) – Published 14 March 2014
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Abstract

Atomically precise tailoring of graphene can enable unusual transport pathways and new nanometer-scale functional devices. Here we describe a recipe for the controlled production of highly regular “5-5-8” line defects in graphene by means of simultaneous electron irradiation and Joule heating by applied electric current. High-resolution transmission electron microscopy reveals individual steps of the growth process. Extending earlier theoretical work suggesting valley-discriminating capabilities of a graphene 5-5-8 line defect, we perform first-principles calculations of transport and find a strong energy dependence of valley polarization of the charge carriers across the defect. These findings inspire us to propose a compact electrostatically gated “valley valve” device, a critical component for valleytronics.

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  • Received 20 August 2013
  • Revised 7 February 2014

DOI:https://doi.org/10.1103/PhysRevB.89.121407

©2014 American Physical Society

Authors & Affiliations

J.-H. Chen1,2,*, G. Autès3, N. Alem1,2,†, F. Gargiulo3, A. Gautam4, M. Linck4,‡, C. Kisielowski4, O. V. Yazyev3, S. G. Louie1,2, and A. Zettl1,2,§

  • 1Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA
  • 2Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 3Institute of Theoretical Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 4National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

  • *Present address: International Center for Quantum Materials, School of Physics, Peking University, Beijing, China 100871.
  • Present address: Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802, USA.
  • Present address: CEOS-GmbH, Englerstr. 28, D-69126 Heidelberg, Germany.
  • §Author to whom correspondence should be addressed: azettl@berkeley.edu

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Issue

Vol. 89, Iss. 12 — 15 March 2014

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