Tailoring magnetoresistance at the atomic level: An ab initio study

Kun Tao, V. S. Stepanyuk, I. Rungger, and S. Sanvito
Phys. Rev. B 85, 045406 – Published 5 January 2012

Abstract

The possibility of manipulating the tunneling magnetoresistance (TMR) of antiferromagnetic nanostructures is predicted in the framework of ab initio calculations. By the example of a junction composed of an antiferromagnetic dimer and a spin-polarized scanning tunneling microscopy tip we show that the TMR can be tuned and even reversed in sign by lateral and vertical movements of the tip. Moreover, our finite-bias calculations demonstrate that the magnitude and the sign of the TMR can also be tuned by an external voltage.

  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Figure
  • Received 15 September 2011

DOI:https://doi.org/10.1103/PhysRevB.85.045406

©2012 American Physical Society

Authors & Affiliations

Kun Tao and V. S. Stepanyuk

  • Max-Planck-Institute of Microstructure Physics, D-06120 Halle, Germany

I. Rungger and S. Sanvito

  • School of Physics and CRANN, Trinity College, Dublin 2, Ireland

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 85, Iss. 4 — 15 January 2012

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×