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Hole reduction and electron accumulation in YBa2Cu3Oy thin films using an electrochemical technique: Evidence for an n-type metallic state

T. Nojima, H. Tada, S. Nakamura, N. Kobayashi, H. Shimotani, and Y. Iwasa
Phys. Rev. B 84, 020502(R) – Published 11 July 2011

Abstract

We demonstrated extreme hole reduction and electron accumulation in YBa2Cu3Oy films by an electrochemical technique. Following the transition from superconductor to insulator, we succeeded in doping electrons as evidenced by the decrease in resistivity and sign change of the Hall coefficient. Further doping resulted in metallic n-type YBa2Cu3Oy with a carrier density of ∼2.5 × 1020 cm3, but without any sign of superconductivity. The oxygen vacancies electrochemically induced in the CuO2 planes played a major role in the p-n transition.

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  • Received 4 October 2010

DOI:https://doi.org/10.1103/PhysRevB.84.020502

©2011 American Physical Society

Authors & Affiliations

T. Nojima1, H. Tada1, S. Nakamura1, N. Kobayashi1, H. Shimotani2, and Y. Iwasa2,3

  • 1Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
  • 2Quantum-Phase Electronics Center, University of Tokyo, Tokyo 113-8656, Japan
  • 3Correlated Electron Research Group (CERG), RIKEN, Wako 341-0198, Japan

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Issue

Vol. 84, Iss. 2 — 1 July 2011

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