Scaling of the anomalous Hall current in Fe100x(SiO2)x films

W. J. Xu, B. Zhang, Q. X. Wang, W. B. Mi, Z. Wang, W. Li, R. H. Yu, and X. X. Zhang
Phys. Rev. B 83, 205311 – Published 20 May 2011

Abstract

To study the origin of the anomalous Hall effect, Fe100x(SiO2)x granular films with a volume fraction of SiO2 (0 ⩽ x ⩽ 40.51) were fabricated using cosputtering. Hall and longitudinal resistivities were measured in the temperature range of 5–350 K with magnetic fields up to 5 T. As x increased from 0 to 40.51, the anomalous Hall resistivity and longitudinal resistivity increased by about four and three orders in magnitude, respectively. Analysis of the results revealed that the normalized anomalous Hall conductivity is a constant for all of the samples, which may suggest a scattering-independent anomalous Hall conductivity in Fe.

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  • Received 15 December 2010

DOI:https://doi.org/10.1103/PhysRevB.83.205311

©2011 American Physical Society

Authors & Affiliations

W. J. Xu1, B. Zhang2, Q. X. Wang2, W. B. Mi3, Z. Wang1, W. Li1, R. H. Yu4, and X. X. Zhang2,*

  • 1Institute of Nanoscience and Technology, The Hong Kong University of Science and Technology (HKUST), Clear Water Bay, Kowloon, Hong Kong, China
  • 2Thin Film Lab, 4700 King Abdullah University of Science and Technology (KAUST), Thuwal 23900-6900, Kingdom of Saudi Arabia
  • 3Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, China
  • 4School of Materials Science and Engineering, Beihang University, Beijing 100191, China

  • *xixiang.Zhang@kaust.edu.sa

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Vol. 83, Iss. 20 — 15 May 2011

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