Abstract
When epitaxial graphene layers are formed on SiC(0001), the first carbon layer (known as the “buffer layer”), while relatively easy to synthesize, does not have the desirable electrical properties of graphene. The conductivity is poor due to a disruption of the graphene bands by covalent bonding to the SiC substrate. Here we show that it is possible to restore the graphene bands by inserting a thin oxide layer between the buffer layer and SiC substrate using a low temperature, complementary metal-oxide semiconductor-compatible process that does not damage the graphene layer.
- Received 24 March 2010
DOI:https://doi.org/10.1103/PhysRevB.82.041411
©2010 American Physical Society
Synopsis
Resurrecting graphene with a breath of oxygen
Published 16 August 2010
A quick and simple processing method ensures that the first layer of graphene grown on silicon carbide will perform as expected.
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