Phase formation in iron silicide nanodots grown by reactive deposition epitaxy on Si(111)

J. C. González, D. R. Miquita, M. I. N. da Silva, R. Magalhães-Paniago, M. V. B. Moreira, and A. G. de Oliveira
Phys. Rev. B 81, 113403 – Published 5 March 2010

Abstract

The epitaxial growth by reactive deposition of ε-FeSi and β-FeSi2 nanodots on Si(111) is studied as a function of Fe coverage. The nanodots density, size, and strain were analyzed by atomic force microscopy and x-ray diffraction. Almost single phase ε-FeSi and β-FeSi2 were formed at low and high iron coverage, respectively. A ε-FeSi to β-FeSi2 change in phase formation is observed at Fe coverage of 5.5 nm, which is coincident with the coalescence of the nanodots, the relaxation of the strain in both phases and a discontinuous increase of the grain size of the β-FeSi2 phase. A direct comparison of the diffraction and microscopy data shows that nanodots of different phases also exhibit different shapes, being the ε-FeSi (β-FeSi2) nanodots smaller (larger) and with a low (high) aspect ratio.

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  • Received 16 December 2009

DOI:https://doi.org/10.1103/PhysRevB.81.113403

©2010 American Physical Society

Authors & Affiliations

J. C. González, D. R. Miquita, M. I. N. da Silva, R. Magalhães-Paniago, M. V. B. Moreira, and A. G. de Oliveira

  • Departamento de Física, Instituto de Ciências Exatas, Universidade Federal de Minas Gerais, Caixa Postal 702, 30123-970 Belo Horizonte, MG, Brazil

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Issue

Vol. 81, Iss. 11 — 15 March 2010

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