Formation and migration of charged native point defects in MgH2: First-principles calculations

Min Sik Park, Anderson Janotti, and Chris G. Van de Walle
Phys. Rev. B 80, 064102 – Published 4 August 2009

Abstract

Using first-principles calculations we have investigated the possible native point defects in bulk MgH2. Due to the interest in this material for hydrogen storage, we have paid particular attention to hydrogen-related defects that are likely to be involved in the absorption and release kinetics of hydrogen. We have considered neutral and charged defects and calculated formation energies as a function of Fermi-level position and hydrogen chemical potential. In the absence of impurities, we find that under extreme H-poor conditions the lowest-energy defects are positively and negatively charged hydrogen vacancies (VH+ and VH). Under extreme H-rich conditions, the lowest-energy defects are VH+, negatively charged hydrogen interstitials (Hi), and negatively charged Mg vacancies VMg2. The defects are characterized by unusually large local structural rearrangements. The hydrogen-related defects are also highly mobile, with a lowest migration barrier of less than 0.10 eV for Hi and H2i, and a highest barrier of 0.63 eV for VH. By combining the calculated formation energies with migration barriers, we find that the lowest activation energy for self-diffusion is about 1.48 eV under H-poor conditions. The consequences of these results for the hydrogenation and dehydrogenation kinetics are discussed.

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  • Received 19 January 2009

DOI:https://doi.org/10.1103/PhysRevB.80.064102

©2009 American Physical Society

Authors & Affiliations

Min Sik Park, Anderson Janotti, and Chris G. Van de Walle

  • Materials Department, University of California, Santa Barbara, California 93106-5050, USA

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Issue

Vol. 80, Iss. 6 — 1 August 2009

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