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Atomic-resolution three-dimensional imaging of germanium self-interstitials near a surface: Aberration-corrected transmission electron microscopy

D. Alloyeau, B. Freitag, S. Dag, Lin W. Wang, and C. Kisielowski
Phys. Rev. B 80, 014114 – Published 27 July 2009
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Abstract

We report the formation and direct observation of self-interstitials in surface proximity of an elemental semiconductor by exploiting subthreshold effects in a new generation of aberration-corrected transmission electron microscopes. We find that the germanium interstitial atoms reside close to hexagonal, tetragonal, and S-interstitial sites. Using phase-contrast microscopy, we demonstrate that the three-dimensional position of interstitial atoms can be determined from contrast analysis, with subnanometer precision along the electron-beam direction. Comparison with a first-principles study suggests a strong influence of the surface proximity or a positively charged interstitial. More generally, our investigation demonstrates that imaging of single atom can now be utilized to directly visualize single-defect formation and migration. These high-resolution electron microscopy studies are applicable to a wide range of materials since the reported noise level of the images even allows the detection of single-light atoms.

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  • Received 10 April 2009

DOI:https://doi.org/10.1103/PhysRevB.80.014114

©2009 American Physical Society

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Are we seeing atoms diffuse?

Published 27 July 2009

A new generation of electron microscopes that correct for spherical aberration may be able to chart the positions of individual atoms as they diffuse through a crystal.

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Authors & Affiliations

D. Alloyeau1,*,†, B. Freitag2, S. Dag3, Lin W. Wang3, and C. Kisielowski1,*,‡

  • 1National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 2FEI Company, Eindhoven, Building AAE, Achtseweg Noord 5, P.O. Box 80066, 5600 KA Eindhoven, The Netherlands
  • 3Scientific Computing Group, Computational Research Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

  • *Corresponding author.
  • FAX: (510) 486-5888; alloyeau.damien@gmail.com
  • cfkisielowski@lbl.gov

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Issue

Vol. 80, Iss. 1 — 1 July 2009

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