Developing antiphase boundaries in one-monolayer TlGe(100) system by re-bonding of underlying Ge dimers

A. A. Saranin, A. V. Zotov, I. A. Kuyanov, Yu. V. Luniakov, M. Katayama, and K. Oura
Phys. Rev. B 76, 193302 – Published 6 November 2007

Abstract

Using scanning tunneling microscopy, it has been found that a one-monolayer TlGe(100)2×1 surface demonstrates a fascinating possibility to form antiphase boundaries (APB’s) by re-bonding underlying Ge dimers. This is in contrast to adsorbate-free Si(100) and Ge(100) surfaces and one-monolayer TlSi(100) system, where APB formation does not occur. Energetics of APB formation in various systems, including adsorbate-free Si(100) and Ge(100) surfaces and TlSi(100) and TlGe(100) systems, have been evaluated using first-principles total-energy calculations, which reveal that TlGe(100) is the only system where APB formation is the energetically favorable process.

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  • Received 21 June 2007

DOI:https://doi.org/10.1103/PhysRevB.76.193302

©2007 American Physical Society

Authors & Affiliations

A. A. Saranin1,2, A. V. Zotov1,2,3, I. A. Kuyanov1,2, Yu. V. Luniakov1, M. Katayama4, and K. Oura5

  • 1Institute of Automation and Control Processes, 690041 Vladivostok, Russia
  • 2Faculty of Physics and Engineering, Far Eastern State University, 690000 Vladivostok, Russia
  • 3Department of Electronics, Vladivostok State University of Economics and Service, 690600 Vladivostok, Russia
  • 4Department of Electronic Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
  • 5Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, Ibaraki, Osaka 567-0047, Japan

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Issue

Vol. 76, Iss. 19 — 15 November 2007

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