Diameter dependence of the growth velocity of silicon nanowires synthesized via the vapor-liquid-solid mechanism

V. Schmidt, S. Senz, and U. Gösele
Phys. Rev. B 75, 045335 – Published 24 January 2007

Abstract

We present a model for the radius dependence of the growth velocity of Si nanowires synthesized via the vapor-liquid-solid mechanism. By considering the interplay of the Si incorporation and crystallization rate at steady state conditions we show that the radius dependence of the growth velocity in general depends on the derivatives of the incorporation and crystallization velocity with respect to the supersaturation. Taking this into account, the apparently contradictory experimental observations regarding the radius dependence of the growth velocity can be reconciled and explained consistently.

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  • Received 29 September 2006

DOI:https://doi.org/10.1103/PhysRevB.75.045335

©2007 American Physical Society

Authors & Affiliations

V. Schmidt*, S. Senz, and U. Gösele

  • Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, D-06120 Halle, Germany

  • *Electronic address: vschmidt@mpi-halle.de

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Issue

Vol. 75, Iss. 4 — 15 January 2007

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