Abstract
The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine , deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components (, , and ) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline mounds during the initial stages of thin film growth.
- Received 21 December 2005
DOI:https://doi.org/10.1103/PhysRevB.73.161305
©2006 American Physical Society