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Anomalous scaling behavior and surface roughening in molecular thin-film deposition

S. Yim and T. S. Jones
Phys. Rev. B 73, 161305(R) – Published 25 April 2006

Abstract

The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H2Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components (αloc=0.61±0.12, β=1.02±0.08, and 1z=0.72±0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H2Pc mounds during the initial stages of thin film growth.

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  • Received 21 December 2005

DOI:https://doi.org/10.1103/PhysRevB.73.161305

©2006 American Physical Society

Authors & Affiliations

S. Yim and T. S. Jones

  • Centre for Electronic Materials and Devices, Department of Chemistry, Imperial College London, London SW7 2AZ, United Kingdom

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Issue

Vol. 73, Iss. 16 — 15 April 2006

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