Correlation between bonding structure and microstructure in fullerenelike carbon nitride thin films

R. Gago, I. Jiménez, J. Neidhardt, B. Abendroth, I. Caretti, L. Hultman, and W. Möller
Phys. Rev. B 71, 125414 – Published 17 March 2005

Abstract

The bonding structure of highly ordered fullerenelike (FL) carbon nitride (CNx) thin films has been assessed by x-ray absorption near-edge spectroscopy (XANES). Samples with different degrees of FL character have been analyzed to discern spectral signatures related to the FL microstructure. The XANES spectra of FLCNx films resemble that of graphitic CNx, evidencing the sp2 hybridization of both C and N atoms. The FL structure is achieved with the promotion of N in threefold positions over pyridinelike and cyanidelike bonding environments. In addition, the relative π*σ* XANES intensity ratio at the C(1s) edge is independent of the FL character, while it decreases 40% at the N(1s) edge with the formation of FL arrangements. This result indicates that there is no appreciable introduction of Csp3 hybrids with the development of FL structures and, additionally, that a different spatial localization of π electrons at C and N sites takes place in curved graphitic structures. The latter has implications for the elastic properties of graphene sheets and could, as such, explain the outstanding elastic properties of FLCNx.

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  • Received 10 June 2004

DOI:https://doi.org/10.1103/PhysRevB.71.125414

©2005 American Physical Society

Authors & Affiliations

R. Gago1,*, I. Jiménez2,4, J. Neidhardt3, B. Abendroth1, I. Caretti4, L. Hultman3, and W. Möller1

  • 1Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, PF-510119, 01314 Dresden, Germany
  • 2Instituto de Ciencia y Tecnología de Polímeros (Consejo Superior de Investigaciones Científicas), 28006 Madrid, Spain
  • 3Thin Film Physics Division, Department of Physics, IFM, Linköping University, S-58183 Linköping, Sweden
  • 4Instituto de Ciencia de Materiales de Madrid (Consejo Superior de Investigaciones Científicas), 28049 Cantoblanco, Madrid, Spain

  • *Corresponding author. Present address: Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid, Spain. FAX: +34-91-4973621/3623. Email address: raul.gago@uam.es

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Vol. 71, Iss. 12 — 15 March 2005

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