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Defect-induced perturbation on Si(111)4×1In: Period-doubling modulation and its origin

Geunseop Lee, Sang-Yong Yu, Hanchul Kim, and Ja-Yong Koo
Phys. Rev. B 70, 121304(R) – Published 14 September 2004

Abstract

A one-dimensional defect-induced local period-doubling (×2) modulation was observed with scanning tunneling microscopy on a Si(111)4×1In surface at room temperature. The ×2 modulated region remains metallic in contrast to the low-temperature 4×2 ground-state phase. First-principles calculations predict the lowest-energy state with exactly the same features as observed by H adsorption, but fundamentally different from the experimentally observed insulating ground state at low temperature. This suggests that the true ground state (i.e., the low-temperature phase) is not a band insulator, and is stabilized by many-body interaction.

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  • Received 21 June 2004

DOI:https://doi.org/10.1103/PhysRevB.70.121304

©2004 American Physical Society

Authors & Affiliations

Geunseop Lee1,*, Sang-Yong Yu2, Hanchul Kim2, and Ja-Yong Koo2

  • 1Inha University, Inchon 402-751, Korea
  • 2Korea Research Institute of Standards and Science, P.O. Box 102, Yuseong, Daejeon 305-600, Korea

  • *Author to whom correspondence should be addressed. Electronic mail: glee@inha.ac.kr

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Issue

Vol. 70, Iss. 12 — 15 September 2004

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