Quantum interference in a one-dimensional silicon nanowire

A. T. Tilke, F. C. Simmel, H. Lorenz, R. H. Blick, and J. P. Kotthaus
Phys. Rev. B 68, 075311 – Published 15 August 2003
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Abstract

We study electronic transport within a lithographically defined silicon nanowire for zero and finite bias. The 10-nm wide and 500-nm long nanowire is fabricated by advanced electron-beam lithographic techniques. Transport experiments reveal clear quantum size effects in the conduction through the wire. Energy quantization within the wire leads to a shift in conduction threshold. Quantum interference effects cause an oscillatory pattern in the conductance. At low source-drain bias, transport is dominated by shallow tunneling barriers. At higher bias, additional nanowire modes are found to contribute to the conductance.

  • Received 4 March 2003

DOI:https://doi.org/10.1103/PhysRevB.68.075311

©2003 American Physical Society

Authors & Affiliations

A. T. Tilke*, F. C. Simmel, H. Lorenz, R. H. Blick, and J. P. Kotthaus

  • Center for NanoScience and Sektion Physik, LMU Munich, Geschwister-Scholl-Platz 1, 80539 München, Germany

  • *Permanent address: Infineon Technologies, Königsbrücker Strasse 180, 01099 Dresden, Germany.
  • Permanent address: Department of Electrical and Computer Engineering, University of Madison-Wisconsin, 1415 Engineering Drive, Madison, Wisconsin 53706, USA.

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Vol. 68, Iss. 7 — 15 August 2003

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