Photoconductivity, low-temperature conductivity, and magnetoresistance studies on the layered semiconductor GaTe

D. N. Bose and Sarbari Pal
Phys. Rev. B 63, 235321 – Published 31 May 2001
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Abstract

Single crystals of pGaTe were grown by the Bridgman technique and characterized through x-ray diffraction, energy-dispersive x-ray analysis, x-ray photoemission spectroscopy, and transmission electron microscopy studies. The photoconductivity spectral response for in-plane conduction showed a peak at 747 nm (1.66 eV). Photoconductivity gain was determined in two orthogonal directions from which the majority carrier (hole) lifetimes were found to be 3.43×107 and 2.03×106s, respectively, parallel and perpendicular to the layer planes. Studies of the temperature dependence of conductivity in the directions along and perpendicular to the layer planes were carried out between 10 and 80 K. Along the layer planes the conductance G varied as lnT between 12 and 20 K, characteristic of weak localization, while between 20 and 50 K the conductivity σ varied as T1/2. In the perpendicular direction the conductance G varied as exp(T/T0)1/3 between 9 and 20 K and the conductivity σ varied as exp(T/T0)1/4 between 20 and 50 K, characteristic of hopping conduction in two and three dimensions, respectively. Negative transverse magnetoresistance was observed at 10 K for conduction in both directions for magnetic fields H<0.4T, the increase in conductance being found to be proportional to H2. Band conduction with positive magnetoresistance was observed for both current directions at T>70K. The IV characteristics at 10 K showed quantized behavior due to electron tunneling across potential barriers caused by stacking faults between layer planes.

  • Received 20 November 2000

DOI:https://doi.org/10.1103/PhysRevB.63.235321

©2001 American Physical Society

Authors & Affiliations

D. N. Bose1 and Sarbari Pal2

  • 1Advanced Technology Center, Indian Institute of Technology, Kharagpur 721 302 India
  • 2Department of Physics, Indian Institute of Technology, Kharagpur 721 302 India

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Vol. 63, Iss. 23 — 15 June 2001

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