Abstract
Surface premelting has been observed on Al(110) by recording Al 2p core-level photoemission at temperatures from T=80 K up to 1 K below the Al bulk melting point (=933.5 K). By comparing spectra from Al(110) and Al(111) surfaces and from liquid aluminum the growth of a quasiliquid layer is established. The thickness of the layer is found to grow logarithmically with temperature, commencing at 150 K below the melting point, with a thickness of about 8 ML at 1 K below . The degree of local structure and density of the quasiliquid layer are determined to be identical to those of liquid aluminum.
- Received 11 July 1994
DOI:https://doi.org/10.1103/PhysRevB.51.7157
©1995 American Physical Society