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Charge state and diffusivity of muonium in n-type GaAs

R. Kadono, A. Matsushita, K. Nagamine, K. Nishiyama, K. H. Chow, R. F. Kiefl, A. MacFarlane, D. Schumann, S. Fujii, and S. Tanigawa
Phys. Rev. B 50, 1999(R) – Published 15 July 1994
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Abstract

The presence of Si donors in GaAs exerts a strong influence on the charge state and diffusion of muonium at the tetrahedral interstitial site (MuT0), while it has relatively weak effect on the bond-center muonium (MuBC0). In metallic GaAs:Si, the highly mobile MuT0 center observed in nonmetallic GaAs is replaced by a charged species (probably Mu) which shows a diffusion rate at least 102 times smaller than the MuT0 center. The MuBC0 center is metastable and its transition to MuT0 or Mu centers (depending on doping concentration) is seen in the 50–150-K range. The current results also suggest that the MuT0 state undergoes fast spin-exchange interaction with conductive carriers prior to the transition MuT0Mu.

    DOI:https://doi.org/10.1103/PhysRevB.50.1999

    ©1994 American Physical Society

    Authors & Affiliations

    R. Kadono and A. Matsushita

    • The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-01, Japan

    K. Nagamine

    • The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-01, Japan
    • Meson Science Laboratory, Faculty of Science, University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan

    K. Nishiyama

    • Meson Science Laboratory, Faculty of Science, University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan

    K. H. Chow, R. F. Kiefl, A. MacFarlane, and D. Schumann

    • TRIUMF and Department of Physics, University of British Columbia, Vancouver, British Columbia, Canada V6T 2A3

    S. Fujii

    • Opto-Electronics Research and Development Laboratories, Sumitomo Electric Industries Ltd., Yokohama, Kanagawa 244, Japan

    S. Tanigawa

    • Institute of Material Science, University of Tsukuba, Tsukuba, Ibaraki 305, Japan

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    Issue

    Vol. 50, Iss. 3 — 15 July 1994

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