Study of plasmon—LO-phonon coupling in Te-doped Ga1xAlxAs

O. K. Kim and W. G. Spitzer
Phys. Rev. B 20, 3258 – Published 15 October 1979
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Abstract

Plasmon-LO-phonon coupling in n-type Ga1xAlxAs has been investigated by measuring the infrared reflectivity spectra of differently doped n-type samples having x0.14, x0.30, and x0.46. Two expressions for the dielectric function, one an additive form and the other a factorized form, have given satisfactory fits to the reflectivity data. The mode frequencies and damping rates in the plasmon-LO-phonon coupled mode systems are calculated and compared with the observed ones for the samples having x0.14 and x0.46. The Γ-point conduction-band effective mass for x0.14 is found to be mΓ*=(0.13±0.01)me and the resistivity obtained from the infrared spectra is approximately 30% higher than the value from dc measurements. The reflectivity minima are broadened by the large plasma damping in the samples having x0.46.

  • Received 28 March 1979

DOI:https://doi.org/10.1103/PhysRevB.20.3258

©1979 American Physical Society

Authors & Affiliations

O. K. Kim and W. G. Spitzer

  • Departments of Physics and Materials Science, University of Southern California, Los Angeles, California 90007

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Issue

Vol. 20, Iss. 8 — 15 October 1979

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