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Pressure-induced metallization and superconductivity in the layered van der Waals semiconductor GaTe

Jin Jiang, Xuliang Chen (陈绪亮), Shuyang Wang, Chao An, Ying Zhou, Min Zhang, Yonghui Zhou, and Zhaorong Yang
Phys. Rev. B 107, 024512 – Published 31 January 2023

Abstract

We present a systematic high-pressure study of layered van der Waals semiconductor GaTe through electrical transport, photoluminescence, and Raman spectroscopy measurements. We report observation of pressure-induced metallization and superconductivity (SC) in GaTe simultaneously occurring at ∼3 GPa, with an onset superconducting critical temperature of TConset5.0K. Analysis shows that a quasi–two-dimensional to three-dimensional structural crossover plays a crucial role in driving the observed metallization and SC. Upon further compression, TConset first decreases gradually and then begins to increase above ∼10 GPa, displaying a V-shaped feature (SC-I→SC-II) due to a structural transition (C2/mFm3m). After reaching a local maximum of 4.5 K at ∼18 GPa, TConset remains almost unchanged up to a highest pressure of 48.1 GPa. A comparison of the upper critical fields at different pressures spanning the SC-I and SC-II phases reveals that their pairing mechanisms may be different from each other. These results demonstrate that the band gap of layered semiconductor GaTe is highly tunable, which may stimulate further investigations by strain engineering, intercalation, and electrostatic doping.

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  • Received 15 December 2022
  • Revised 17 January 2023
  • Accepted 19 January 2023

DOI:https://doi.org/10.1103/PhysRevB.107.024512

©2023 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jin Jiang1,2, Xuliang Chen (陈绪亮)2,3,*, Shuyang Wang2,3, Chao An1, Ying Zhou1, Min Zhang1, Yonghui Zhou2,3, and Zhaorong Yang1,2,3,†

  • 1Institutes of Physical Science and Information Technology, Anhui University, Hefei 230601, China
  • 2Anhui Province Key Laboratory of Condensed Matter Physics at Extreme Conditions, High Magnetic Field Laboratory, HFIPS, Chinese Academy of Sciences, Hefei 230031, China
  • 3Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China

  • *xlchen@hmfl.ac.cn
  • zryang@issp.ac.cn

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Issue

Vol. 107, Iss. 2 — 1 January 2023

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